Origin: 2005, New York, USA
Designer: Patrik Ervell
The Swedish-born Ervell got a political science degree from UC Berkeley and fell into design in 2005 after working as an editor at V magazine. His aesthetic is minimal, and involves creative use of utilitarian materials—think parachute fabric and solar-blanket fibers. In 2007, the year of his first runway show, Ervell won a $25,000 Ecco Domani Fashion Foundation Award.
Ervell’s designs focus on minimal, carefully tailored American sportswear, with luxurious touches. Austere, minimalist staples for downtown types. Futurism and technology is a prevailing theme; the label is known for its use of technical fabrics and utilitarian materials. With Patrik Ervell there is always a sense of clean cut minimalism showcased in his simple lines and impeccably sharp tailoring but here he fused his signature with an unexpected mix of fabrics and a extraordinary sense of details and perfect finishes.